7. Given the structure shown below: (a) Describe the process steps required to realize the structure. (6 marks) (b) How would the process be different if the scale bar was 200nm instead of 20μm? Give reasoning for your answer. (3 marks) (c) What type of stress is observed in the oxide layer? Give reasoning for your answer. (2 marks) 1.61KX 14KU ND 31MM S 00000 P 00006 200M SiO2 Si