Question

n_i = 10^{10} frac{elektron}{cm^3}; mu_n = 1320 frac{cm^2}{V.s}; mu_p = 460 frac{cm^2}{Vs}; q = 1.6x10^{-19} C; V_T = 0.026 V

          n_i = 10^{10} frac{elektron}{cm^3}; mu_n = 1320 frac{cm^2}{V.s}; mu_p = 460 frac{cm^2}{Vs}; q = 1.6x10^{-19} C; V_T = 0.026 V
        
ni = 10^10 fracelektroncm^3; mun = 1320 fraccm^2V.s; mup = 460 fraccm^2Vs; q = 1.6x10^-19 C; VT = 0.026 V

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Semiconductor Physics and Devices
Semiconductor Physics and Devices
Donald A. Neamen 4th Edition
Chapter 7
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A p-n junction is formed by combining doped n-type silicon with ρ = 2 (Ωcm) resistance and doped p-type silicon with the same resistance. Calculate the built-in potential barrier of this junction.
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Transcript

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00:01 We'd like to calculate the built -in voltage.
00:04 So now, beginning with this, we can first calculate our conductivity.
00:10 Our conductivity is 1 over our resistivity, which is 1 over 2, and so we get 0 .51 ohms per centimeter, or 0 .50.
00:21 Now we could find, we have our conductivity given as nq mu n, and sigma p is pq mu p.
00:35 So sigma n is point, is equal to 0 .5.
00:38 So we have 0 .5 equal to n times 1 .6 times 10 to the negative 19 times 1320.
00:46 And so we can solve for nd...
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