n_i = 10^{10} frac{elektron}{cm^3}; mu_n = 1320 frac{cm^2}{V.s}; mu_p = 460 frac{cm^2}{Vs}; q = 1.6x10^{-19} C; V_T = 0.026 V
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(a) A one-sided silicon $\mathrm{n}^{+} \mathrm{p}$ junction at $T=300 \mathrm{~K}$ is doped at $N_{d}=3 \times 10^{17} \mathrm{~cm}^{-3}$. Design the junction such that $C_{j}=0.45 \mathrm{pF}$ at $V_{R}=5 \mathrm{~V} .(b)$ Calculate the junction capacitance at $(i) V_{R}=2.5 \mathrm{~V}$ and $(i i) V_{R}=0 \mathrm{~V}$.
An abrupt silicon p-n junction consists of a p-type region containing 10^16 /cm^3 acceptors and an n-type region containing also 10^16 /cm^3 acceptors in addition to 10^17/ cm^3 donors. a. Calculate the thermal equilbrium density of electrons and holes in the p-type region as well as both densities in the n-type region. b. Calculate the built-in potential of the p-n junction. c. Calculate the built-in potential of the p-n junction at 100 C.
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An ideal one-sided silicon $\mathrm{p}^{+} \mathrm{n}$ junction at $T=300 \mathrm{~K}$ is uniformly doped on both sides of the metallurgical junction. It is found that the doping relation is $N_{a}=80 N_{d}$ and the built-in potential barrier is $V_{b i}=0.740 \mathrm{~V}$. A reverse-biased voltage of $V_{R}=10 \mathrm{~V}$ is applied. Determine ( a) $N_{a}, N_{d} ;$ (b) $x_{p}, x_{n} ;(c)\left|\mathrm{E}_{\max }\right|$; and $(d) C_{j}^{\prime} .$
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