From Problem 10.5: The silicon impurity doping concentration in an aluminum-silicon dioxide-silicon MOS device is Na = 4x10^16 cm^-3.
10.7
a) Consider the MOS capacitor described in Problem 10.5. For an oxide thickness of tox = 20 nm = 200 A and an oxide charge of Q' = 5 x 10^11 cm^-2, calculate the flat-band voltage.
b) Repeat part (a) for an oxide thickness of tox = 8 nm = 80 A.