need help with the problem in the image. it is for my solid state elctronics class. please include all steps, i will thumbs up a helpful solution.
1.a) Find the (i) (10pts) maximum depletion width, (ii) (10pts) minimum capacitance, and (iii) (10pts) threshold voltage for an ideal MOS capacitor with a 5nm SiO2 oxide (& = 3.9&o) on p-type Si with N = 5x1016/cm3. The electron affinity of Si is 4.05 eV and the bandgap is 1.12 eV.
(b) Now include the effect of flat band voltage assuming an p* poly crystalline silicon (polysilicon) gate and a fixed surface state density of (1.602x10-19)(1011) C / cm2. You assume that the Fermi level of the p+ polysilicon gate is at the valence band edge of the polysilicon,and that the polysilicon has the same electron affinity and bandgap as Si. Use this information to first determine ms. Determine the (i) (10pts) flat band voltage,VFB, and the (ii)10pts) threshold voltage,Vt.