A Hall probe used to measure magnetic field strengths consists of a rectangular slab of material (free-electron density $n$ ) with width $d$ and thickness $t,$ carrying a current $I$ along its length $\ell$. The slab is immersed in a magnetic field of magnitude $B$ oriented perpendicular to its rectangular face (of area $\ell d$ ), so that a Hall emf $\mathscr{E}_{\mathrm{H}}$ is produced across its width $d$. The probe's magnetic sensitivity, defined as $K_{\mathrm{H}}=\mathscr{E}_{\mathrm{H}} / I B,$ indicates the magnitude of the Hall emf achieved for a given applied magnetic field and current. A slab with a large $K_{\mathrm{H}}$ is a good candidate for use as a Hall probe. (a) Show that $K_{\mathrm{H}}=1$ /ent. Thus, a good Hall probe has small values for both $n$ and $t .(b)$ As possible candidates for the material used in a Hall probe, consider
(i) a typical metal $\left(n \approx 1 \times 10^{29} / \mathrm{m}^{3}\right)$ and
(ii) a (doped) semiconductor $\left(n \approx 3 \times 10^{22} / \mathrm{m}^{3}\right)$. Given that a semiconductor slab can be manufactured with a thickness of $0.15 \mathrm{~mm}$, how thin (nm) should a metal slab be to yield a $K_{H}$ value equal to that of the semiconductor slab? Compare this metal slab thickness with the 0.3 -nm size of a typical metal atom. (c) For the typical semiconductor slab described in part $(b),$ what is the expected value for $\mathscr{E}_{\mathrm{H}}$ when $I=100 \mathrm{~mA}$ and $B=0.1 \mathrm{~T} ?$