(a) Determine the position of the Fermi energy level with respect to the intrinsic Fermi level in silicon at $T=300 \mathrm{~K}$ that is doped with boron atoms at a concentration of $N_{a}=2 \times 10^{16} \mathrm{~cm}^{-3} \cdot(b)$ Repeat part $(a)$ if the silicon is doped with phosphorus atoms at a concentration of $N_{d}=2 \times 10^{16} \mathrm{~cm}^{-3} \cdot(c)$ Calculate $n_{0}$ and $p_{0}$ in parts $(a)$ and $(b)$.