A silicon pn junction in thermal equilibrium at $T=300 \mathrm{~K}$ is doped such that $E_{F}-E_{F i}=0.365 \mathrm{eV}$ in the $\mathrm{n}$ region and $E_{F i}-E_{F}=0.330 \mathrm{eV}$ in the $\mathrm{p}$ region. (a) Sketch the energy-band diagram for the pn junction. ( $b$ ) Find the impurity doping concentration in each region. (c) Determine $V_{b i}$