Consider the ideal long silicon pn junction shown in Figure $\mathrm{P} 8.17 . T=300 \mathrm{~K}$. The n region is doped with $10^{16}$ donor atoms per $\mathrm{cm}^{3}$ and the p region is doped with $5 \times 10^{16}$ acceptor atoms per $\mathrm{cm}^{3} .$ The minority carrier lifetimes are $\tau_{n 0}=0.05 \mu \mathrm{s}$ and $\tau_{p 0}=0.01 \mu \mathrm{s}$. The minority carrier diffusion coefficients are $D_{n}=23 \mathrm{~cm}^{2} / \mathrm{s}$ and $D_{p}=8 \mathrm{~cm}^{2} / \mathrm{s}$. The forward-bias voltage is $V_{a}=0.610 \mathrm{~V} .$ Calculate $(a)$ the excess hole concentration as a function of $x$ for $x \geq 0,(b)$ the hole diffusion current density at $x=3 \times 10^{-4} \mathrm{~cm}$, and $(c)$ the electron current density at $x=3 \times 10^{-4} \mathrm{~cm} .$