In a Si base long p'n diode, the excess hole distribution due to optical excitation becomes
$$
\delta p\left(x_{n}\right)=\left[p_{n} \cdot\left(e^{a V K T}-1\right)-g_{o p}, \frac{L_{p}^{2}}{D_{p}}\right] \cdot e^{-x_{n} / L_{p}}+g_{o p}, \frac{L_{p}^{2}}{D_{p}}
$$
Suppose for such a device acceptor concentration is $10^{18} / \mathrm{cm}^{3}$, diffusion coefficient for holes is $10.36 \mathrm{~cm}^{2} / \mathrm{sec}$, mobility for holes is $400 \mathrm{~cm}^{2} / \mathrm{V}-\mathrm{sec}$, carrier lifetime = $10 \mathrm{~ns}$ and applied bias is $0.7 \mathrm{~V}$. Due to uniform illumination, $10^{20} / \mathrm{cm}^{3}$ EHP is generated. Now calculate the excess hole distribution for this long diode at a distance of twice the diffusion length from the junction at the $\mathrm{n}$ side.