Question

An optical lithography process using h-line illumination can produce a minimum printable \\ $k\lambda$ $0.6\lambda$ feature (resolution = $R = \frac{k\lambda}{NA}$) of 400 nm with a Depth of Focus (DOF = $\frac{0.6\lambda}{NA^2}$) of 600 nm.\\ There is a new Stepper which has the same technology factor $k$ for resolution and numerical\\ aperture (NA). The light source of the new Stepper has a wavelength of 436 nm. If the engineer\\ wants to realize a resolution = 410 nm and a DOF = 620 nm, is he able to achieve his target\\ using the new Stepper? Show calculations to justify your choice.

          An optical lithography process using h-line illumination can produce a minimum printable \\
$k\lambda$
$0.6\lambda$
feature (resolution = $R = \frac{k\lambda}{NA}$) of 400 nm with a Depth of Focus (DOF = $\frac{0.6\lambda}{NA^2}$) of 600 nm.\\
There is a new Stepper which has the same technology factor $k$ for resolution and numerical\\
aperture (NA). The light source of the new Stepper has a wavelength of 436 nm. If the engineer\\
wants to realize a resolution = 410 nm and a DOF = 620 nm, is he able to achieve his target\\
using the new Stepper? Show calculations to justify your choice.

An optical lithography process using h-line illumination can produce a minimum printable

kλ
0.6λ
feature (resolution = R = (kλ)/(NA)) of 400 nm with a Depth of Focus (DOF = (0.6λ)/(NA^2)) of 600 nm.

There is a new Stepper which has the same technology factor k for resolution and numerical

aperture (NA). The light source of the new Stepper has a wavelength of 436 nm. If the engineer

wants to realize a resolution = 410 nm and a DOF = 620 nm, is he able to achieve his target

using the new Stepper? Show calculations to justify your choice.

Added by James J.

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