3.(18) The energy band diagram of an ideal MOS capacitor structure with oxide thickness, tox = 0.2m, operating at the temperature T = 300K is sketched below. Note that the voltage caused band bending such that EF = Ei at the oxide-silicon interface.
a) What is the surface potential, Ļs ?
b) Sketch the electrostatic potential, Ļ, in the semiconductor as a function of the position, x.
c) Sketch the electric field, E, in the semiconductor as a function of the position, x.
d) What is the electron concentration at the oxide-silicon interface?
e) Roughly sketch the electron concentration, n versus position, x, in the semiconductor.
f) What is the doping level of the bulk?